Titanium alloys are very hard to machine materials, which can be machined effectively by using advanced manufacturing processes. Electro discharge machining (EDM) process is one of the most efficient methods of machining electrically conductive materials. EDM is focused more on the precision and accuracy of the machined parts. This particular work focuses on the machinability study of titanium diamond using micro-EDM. Input parameters such as voltage, capacitance, feed rate and tool rotation speed (TRS) are varied and their effects are analyzed by evaluating responses such as material removal rate (MRR), machining time (MT), overcut (OC) and circularity error (CE). X-ray diffraction (XRD) analysis of the material is also conducted to observe the material phases and elements. The observed responses are simultaneously optimized by formulating overall evaluation criteria (OEC) for generating the optimal value of process parameters. Further, the analysis of variance (ANOVA) provides the influence of input parameters on each output response. The variation of different response measures with respect to input parameters is shown through 3D response surface plots. It is observed in micro EDM that the MT decreases with the increase in voltage, capacitance, feed rate and TRS, whereas MRR and OC increase with an increase in voltage and capacitance. In the case of CE, it decreases with the increase in voltage and it increases with the increase in capacitance.

钛合金很难加工，可以通过使用先进的制造工艺有效地加工。放电加工（EDM）工艺是加工导电材料的最有效方法之一。EDM更注重于加工零件的精度和准确性。这项特殊的工作着重于使用微型EDM对钛金刚石进行切削加工的研究。输入参数（例如电压，电容，进给速度和刀具旋转速度（TRS））发生变化，并通过评估响应（例如材料去除率（MRR），加工时间（MT），过切（OC）和圆度误差（ CE）。还对材料进行了X射线衍射（XRD）分析，以观察材料的相和元素。通过制定总体评估标准（OEC）来优化所观察到的响应，以生成最佳过程参数值。此外，方差分析（ANOVA）提供了输入参数对每个输出响应的影响。通过3D响应曲面图显示了不同响应措施相对于输入参数的变化。在微型EDM中观察到，MT随着电压，电容，馈电速率和TRS的增加而降低，而MRR和OC随着电压和电容的增加而增加。在CE的情况下，它随电压的增加而减小，而随电容的增加而增大。方差分析（ANOVA）提供了输入参数对每个输出响应的影响。通过3D响应曲面图显示了不同响应措施相对于输入参数的变化。在微型EDM中观察到，MT随着电压，电容，馈电速率和TRS的增加而降低，而MRR和OC随着电压和电容的增加而增加。在CE的情况下，它随电压的增加而减小，而随电容的增加而增大。方差分析（ANOVA）提供了输入参数对每个输出响应的影响。通过3D响应曲面图显示了不同响应措施相对于输入参数的变化。在微型EDM中观察到，MT随着电压，电容，馈电速率和TRS的增加而降低，而MRR和OC随着电压和电容的增加而增加。在CE的情况下，它随电压的增加而减小，而随电容的增加而增大。