Massively parallel electron-beam systems are equipped with a large number of beams to improve the writing throughput. It is unavoidable that some of the beams are abnormal, e.g., always on or off, spatial and temporal fluctuations of beam current, beam-positioning error, etc. A practical approach to improve the writing quality is to spread the negative effects of abnormal beams spatially. The multirow writing (MRW) was introduced, which uses each beam to expose pixels over multiple rows in each writing path minimizing the localization of pixels affected by an abnormal beam. In another method, the single-row writing (SRW), each beam exposes pixels in one row in each writing path localizing the affected pixels in a row. To spread the negative effects, especially for the single-row writing, each row of pixels may be exposed through multiple passes, i.e., multipass writing. In this study, the multirow and multipass writing methods in various combinations with the MRW and SRW are compared in terms of their effectiveness in reducing the negative effects of abnormal beams. The results from an extensive simulation study are analyzed in detail.

中文翻译：

---

大规模并行电子束系统的多通道和多行写入方法的有效性

大规模平行电子束系统配备有大量电子束以提高写入吞吐量。不可避免地会出现一些光束异常，例如，总是开或关，光束电流的时空波动，光束定位错误等。 提高写入质量的实用方法是分散异常光束的负面影响空间上。引入了多行写入 (MRW)，它使用每个光束来曝光每个写入路径中多行的像素，从而最大限度地减少受异常光束影响的像素的定位。在另一种方法中，单行写入 (SRW)，每条光束在每个写入路径中暴露一行中的像素，定位一行中的受影响像素。为了分散负面影响，特别是对于单行写入，每行像素可能会通过多次曝光，即。例如，多遍写入。在这项研究中，比较了与 MRW 和 SRW 各种组合的多行和多遍写入方法在减少异常光束负面影响方面的有效性。详细分析了广泛的模拟研究的结果。