In this paper, we demonstrate the fabrication of TiO2 patterns on both planar and various highly curved substrates via nanoimprint lithography followed by thermal treatment. First, a photocurable Ti-containing monomer is synthesized by reacting titanium (IV) ethoxide with 2-(methacryloyloxy)ethyl acetoacetate. The monomer is formulated with a visible light photoinitiator system to prepare a photocurable nanoimprint resin (TiO2-resin). Afterward, the resin is able to be patterned onto highly curved substrates using a soft mold via the double transfer technique. Resin patterns can be simply transformed to TiO2 patterns after thermal treatment. Refractive index of TiO2 can also be tuned by changing the calcination condition.

中文翻译：

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在高度弯曲的基板上直接压印 TiO2 图案

在本文中，我们展示了通过纳米压印光刻和热处理在平面和各种高度弯曲的基板上制造 TiO2 图案。首先，通过使乙醇钛 (IV) 与乙酰乙酸 2-(甲基丙烯酰氧基) 乙酯反应合成可光固化的含钛单体。该单体与可见光光引发剂体系配制成可光固化纳米压印树脂（TiO2-resin）。之后，可以通过双转移技术使用软模具将树脂图案化到高度弯曲的基板上。树脂图案可以在热处理后简单地转变为 TiO2 图案。TiO2 的折射率也可以通过改变煅烧条件来调整。