ABSTRACT The present paper demonstrates the annealing temperature effect on the structural, optical and morphological properties of electrodeposited copper (I) oxide (Cu2O) thin films on ITO-glass substrates. The optical properties were itemized by using spectroscopic ellipsometry (SE) and an adequate model was simulated using WinElli II software. The finite difference time domain simulation, X-ray diffraction and atomic force microscopy (AFM) data show good conformity with the SE measurements. For the surface roughness, good matching between the results of SE and AFM measurements was observed. The refractive index and extinction coefficient had decreased with increasing annealing temperature. On the contrary, the optical gap (Eg) had increased as the annealing temperature increases. Two optical band gaps observed in the sample annealed at 350°C indicate the presence of CuO and Cu2O phases. These results were confirmed by X-ray diffraction measurements. GRAPHICAL ABSTRACT

中文翻译：

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电沉积 Cu2O 薄膜的椭圆偏振光谱研究和形态表征：退火效应

摘要本论文证明了退火温度对 ITO 玻璃基板上电沉积氧化铜 (I) (Cu2O) 薄膜的结构、光学和形态特性的影响。使用光谱椭偏仪 (SE) 逐项列出光学特性，并使用 WinElli II 软件模拟适当的模型。有限差分时域模拟、X 射线衍射和原子力显微镜 (AFM) 数据显示出与 SE 测量结果的良好一致性。对于表面粗糙度，观察到 SE 和 AFM 测量结果之间的良好匹配。折射率和消光系数随着退火温度的升高而降低。相反，光学间隙（Eg）随着退火温度的升高而增加。在 350°C 下退火的样品中观察到的两个光学带隙表明存在 CuO 和 Cu2O 相。这些结果通过 X 射线衍射测量得到证实。图形概要