Mass‐to‐charge ion composition of plasma in a magnetron discharge with reactive sputtering of titanium target,Plasma Processes and Polymers

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Mass‐to‐charge ion composition of plasma in a magnetron discharge with reactive sputtering of titanium target
Plasma Processes and Polymers ( IF 2.9 ) Pub Date : 2020-12-02 , DOI: 10.1002/ppap.202000210
Andrey V. Tyunkov ₁ , Victor A. Burdovitsin ₁ , Efim M. Oks _{1,

2} , Maxim V. Shandrikov ₂ , Yury G. Yushkov ₁ , Sergey M. Zavadsky ₃ , Denis B. Zolotukhin ₁

Affiliation

In this study, we have analyzed the ion mass‐to‐charge composition of the plasma of a magnetron discharge with a titanium target operating in various gases: argon, nitrogen, oxygen, and their mixtures. The addition of nitrogen and oxygen to argon significantly affects the ion spectrum in the magnetron discharge plasma. The increased fraction of nitrogen in the mixture of more than 15% contributes to the dominance of atomic nitrogen ions in the spectrum and leads to a strong decrease in both the plasma density and the metal (titanium) ion fraction in the plasma. The addition of more than 10% oxygen leads to the complete absence of metal ions in the spectrum. These effects are associated with the formation of nitride and oxide layers on the titanium target surface, thus inhibiting the introduction of metal ions in the plasma.

中文翻译：

钛靶反应溅射在磁控管放电中等离子体的质荷离子组成

在这项研究中，我们分析了磁控管放电的等离子体的离子质荷组成，其中的钛靶材在各种气体（氩气，氮气，氧气及其混合物）中运行。向氩气中添加氮和氧会显着影响磁控管放电等离子体中的离子光谱。混合物中氮的增加比例超过15％有助于光谱中原子氮离子的占优势，并导致等离子体密度和等离子体中金属（钛）离子比例均大幅下降。添加超过10％的氧气会导致光谱中完全没有金属离子。这些效应与在钛靶表面上形成氮化物和氧化物层有关，从而抑制了等离子体中金属离子的引入。

更新日期：2020-12-02

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