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Influence of Fe3+ ions doping on TiO2 thin films: Defect generation, d-d transition and band gap tuning for optoelectronic device applications
Physica B: Condensed Matter ( IF 2.8 ) Pub Date : 2020-11-27 , DOI: 10.1016/j.physb.2020.412618
Tapash Chandra Paul , Majibul Haque Babu , Jiban Podder , Bidhan Chandra Dev , Sapan Kumar Sen , Suravi Islam

In this article, we have explored the influence of Fe3+ ion on the surface morphological, structural, optical and electrical properties of TiO2 thin films grown on glass substrates by thermal spray pyrolysis technique. The FESEM micrographs of the deposited TiO2 thin films reveal that the surface consists of agglomerates of small grains. The anatase and rutile phase is confirmed by XRD and Debye-Scherer (D-S), Uniform Deformation Model (UDM) and Halder-Wagner (HW) method are employed to determine the structural parameters using XRD peak profile analysis. A red shift occurs in absorption spectra and band gap decreases with Fe content. The optical parameters such as skin depth, optical static dielectric constant, Urbach energy, etc and Electron-phonon interaction are increased with increasing Fe contents, whereas steepness parameter decreases. The electrical properties are studied by Hall Effect measurements. The paramount study is useful for standardizing the Fe-doped TiO2 thin films for optoelectronic device applications.



中文翻译:

Fe 3+离子掺杂对TiO 2薄膜的影响:光电器件应用中的缺陷产生,dd跃迁和带隙调整

在本文中,我们探讨了Fe 3+离子对通过热喷涂热解技术在玻璃基板上生长的TiO 2薄膜的表面形态,结构,光学和电学性质的影响。沉积的TiO 2的FESEM显微照片薄膜表明表面由小颗粒的团聚体组成。通过XRD和Debye-Scherer(DS)确认了锐钛矿和金红石相,采用XRD峰轮廓分析采用均匀变形模型(UDM)和Halder-Wagner(HW)方法确定结构参数。吸收光谱中发生红移,并且带隙随Fe含量的增加而减小。随着Fe含量的增加,诸如趋肤深度,光学静态介电常数,Urbach能量等光学参数以及电子-声子相互作用会增加,而陡度参数会降低。通过霍尔效应测量来研究电性能。最重要的研究对于标准化用于光电子器件应用的Fe掺杂的TiO 2薄膜是有用的。

更新日期:2021-01-18
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