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The Optimum Electrolyte Parameters in the Application of High Current Density Silver Electrorefining
Metals ( IF 2.6 ) Pub Date : 2020-11-28 , DOI: 10.3390/met10121596
Arif T. Aji , Jari Aromaa , Mari Lundström

Increasing silver production rate has been a challenge for the existing refining facilities. The application of high current density (HCD) as one of the possible solutions to increase the process throughput is also expected to reduce both energy consumption and process inventory. From the recently-developed models of silver electrorefining, this study simulated the optimum electrolyte parameters to optimize the specific energy consumption (SEC) and the silver inventory in the electrolyte for an HCD application. It was found that by using [Cu2+] in electrolyte, both objectives can be achieved. The suggested optimum composition range from this study was [Ag+] 100–150 g/dm3, [HNO3] 5 g/dm3, and [Cu2+] 50–75 g/dm3. HCD application (1000 A/m2) in these electrolyte conditions result in cell voltage of 2.7–3.2 V and SEC of 0.60–1.01 kWh/kg, with silver inventory in electrolyte of 26–39 kg silver for 100 kg per day basis. The corresponding figures for the conventional process were 1.5–2.8 V, 0.44–0.76 kWh/kg, and 15.54–194.25 kg, in respective order. These results show that, while HCD increases SEC by app. 30%, the improvement provides a significant smaller footprint as a result of a more compact of process. Thus, applying HCD in silver electrorefining offers the best solution in increasing production capacity and process efficiency.

中文翻译:

高电流密度银电解精制中的最佳电解质参数

对于现有的精炼设备而言,提高白银生产率一直是一个挑战。高电流密度(HCD)作为增加过程吞吐量的可能解决方案之一的应用也有望减少能耗和过程库存。根据最近开发的银电精炼模型,该研究模拟了最佳电解质参数,以优化比耗电量(SEC)和HCD应用中电解质中的银库存。发现通过在电解质中使用[Cu 2+ ],可以实现两个目的。该研究建议的最佳组成范围为[Ag + ] 100–150 g / dm 3[HNO 3] 5 g / dm 3[Cu 2+ ] 50-75 g / dm 3。在这些电解液条件下使用HCD(1000 A / m 2)会导致电池电压为2.7–3.2 V,SEC值为0.60–1.01 kWh / kg,电解液中的银库存为26–39 kg,每天100公斤。常规工艺的相应数字分别为1.5–2.8 V,0.44–0.76 kWh / kg和15.54–194.25 kg。这些结果表明,尽管HCD通过应用程序增加了SEC。30%的改进由于更紧凑的工艺而显着减小了占地面积。因此,将HCD应用于银电精炼提供了提高生产能力和工艺效率的最佳解决方案。
更新日期:2020-12-01
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