Abstract

In this article, a mosaic target made of ZnO and Al-Cu atoms were used for fabricating of the Cu-Al doped zinc oxide films (CAZO films) using RF magnetron co-sputtering. The CAZO films were deposited in room temperature on glass substrates with the sputtering gases O₂ and Ar in proportion of 30%. Then, films were annealed at different temperatures of 400, 500, and 600 °C in a electrical furnace with Ar atmosphere. Atomic Force Microscopy images showed that the size of nanoparticles in films annealed at 600 °C have maximum value about of 18.8 nm. Atomic Force Microscopy data shown that the films annealed at 600 °C were rougher and they were about of 4.68 nm. Transmittance T(λ) and reflectance R(λ) measurements in the wavelength range (300–2500 nm) were used to calculate the absorption coefficient α (λ), the refractive index n(λ), the optical dispersion parameters according to Wemple and Didomenico, and the optical band gap of films. The optical band gap has been estimated and confirmed by five different methods. It can be seen that with increasing annealing temperature the optical band gap of films were decreased. Films annealed at 400°C have more disordered. It is found that the as films annealed at 500°C have minimum values of the dispersion energy E_d and the oscillator strength fin about of 0.57 eV and 2.42 (eV)², respectively. The as deposited films have minimum values of oscillator length strength S₀ in about of 5.5 μm⁻².

摘要

在本文中，使用由 ZnO 和 Al-Cu 原子制成的镶嵌靶材用于使用射频磁控管共溅射制备 Cu-Al 掺杂氧化锌薄膜（CAZO 薄膜）。CAZO薄膜在室温下沉积在玻璃基板上，溅射气体O ₂和Ar的比例为30%。然后，在 Ar 气氛的电炉中，在 400、500 和 600°C 的不同温度下对薄膜进行退火。原子力显微镜图像显示，在 600 °C 退火的薄膜中纳米颗粒的尺寸最大值约为 18.8 nm。原子力显微镜数据显示，在 600 °C 退火的薄膜更粗糙，约为 4.68 nm。透射率T ( λ ) 和反射率R ( λ) 在波长范围 (300–2500 nm) 的测量值用于计算吸收系数α ( λ )、折射率n ( λ )、根据 Wemple 和 Didomenico 的光学色散参数以及薄膜的光学带隙。光学带隙已通过五种不同的方法进行估计和确认。可以看出，随着退火温度的升高，薄膜的光学带隙减小。在 400 ° C退火的薄膜更加无序。发现在 500 ° C 退火的 as 薄膜的色散能E _d和振子强度f的最小值分别约为 0.57 eV 和 2.42 (eV) ²。所沉积的膜具有约5.5μm ^{-2的振荡器长度强度}S ₀的最小值。