Abstract In this work we deposited nickel thin films by Glancing Angle Deposition at two different angles (65° and 85°) onto glass substrates. The structure of the films, thicknesses between 50 and 200 nm, was studied by scanning electron microscopy, atomic force microscopy and X-ray diffraction, while the chemical properties were analyzed using X-ray photoelectron spectroscopy. According to the obtained results it can be seen that the deposition angle has influence on porosity, crystallinity and surface roughness. Optical properties were investigated by spectroscopic ellipsometry and electrical properties were measured by four point probe. Spectroscopic ellipsometry revealed that the refractive index and extinction coefficient varied with thickness and deposition angle, which can be correlated with changes in microstructure and porosity of Ni films. The observed variations in resistivity could be attributed to the changes in the width of the columns, as well as to the amount of oxide present in the samples.

中文翻译：

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倾斜柱状镍薄膜孔隙率和光学性能的控制

摘要 在这项工作中，我们通过以两个不同的角度（65° 和 85°）将镍薄膜沉积在玻璃基板上。通过扫描电子显微镜、原子力显微镜和 X 射线衍射研究了厚度在 50 到 200 nm 之间的薄膜的结构，同时使用 X 射线光电子能谱分析了化学性质。根据所得结果可以看出，沉积角度对孔隙率、结晶度和表面粗糙度有影响。通过光谱椭偏仪研究光学特性，并通过四点探针测量电特性。光谱椭偏法显示折射率和消光系数随厚度和沉积角度而变化，这可能与 Ni 膜的微观结构和孔隙率的变化相关。观察到的电阻率变化可归因于柱宽的变化以及样品中存在的氧化物量。