We present the results of a theoretical calculation and an experimental study of double-sided antireflective processing of a dielectric plate by creating a specially profiled corrugated structure on its surface. Such a structure allows one to minimize the reflection coefficient of an electromagnetic wave to a level of about −30 dB within a range of at least one octave. This antireflective effect can be used in energy output windows of frequency-tunable generators operated in the millimeter- and submillimeter-wave bands. It can also be applied in windows of wideband spectroscopy devices used to diagnose a broad range of materials including both gases and condensed media, as well as in medical devices, in which the studied sample/object is placed in a vacuum-tight box. Theoretical calculations are based on solving numerically the complete equations of the electromagnetic field. Reflections from double-sided corrugated plates were studied experimentally using a Michelson interferometer. It is shown that the reflection coefficient is equal to no more than −23 dB in the 50–220 GHz frequency range. The antireflective profile was manufactured using a plate of radiation-processed fluorine F-4 (Raflon). This new material allowed us to manufacture an antireflective structure with a required accuracy.

中文翻译：

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用于毫米波和亚毫米波真空设备的宽带窗口

我们通过在其表面上创建特殊异形波纹结构，介绍了对介电板进行双面抗反射处理的理论计算和实验研究的结果。这种结构允许在至少一个倍频程的范围内将电磁波的反射系数最小化到大约-30dB的水平。这种抗反射效应可用于在毫米波和亚毫米波波段工作的频率可调发生器的能量输出窗口。它还可以应用于宽带光谱设备的窗口，用于诊断包括气体和冷凝介质在内的广泛材料，以及医疗设备，其中研究的样本/物体放置在真空密封的盒子中。理论计算基于对电磁场的完整方程进行数值求解。使用迈克尔逊干涉仪对双面波纹板的反射进行了实验研究。结果表明，在 50-220 GHz 频率范围内，反射系数等于不超过 -23 dB。使用辐射处理的氟 F-4 (Raflon) 板制造抗反射型材。这种新材料使我们能够以所需的精度制造抗反射结构。使用辐射处理的氟 F-4 (Raflon) 板制造抗反射型材。这种新材料使我们能够以所需的精度制造抗反射结构。使用辐射处理的氟 F-4 (Raflon) 板制造抗反射型材。这种新材料使我们能够以所需的精度制造抗反射结构。