Aluminum oxide films deposited by spatial atomic layer deposition have been used for thin-film encapsulation of organic light-emitting diodes. In this study, a multidensity layer structure consisting of two Al₂O₃ layers of different densities was deposited at varying ozone flow rates. The structure improved moisture permeation barrier characteristics, as confirmed by the water vapor transmission rate (WVTR) measurement. The lowest WVTR of the multidensity layer structure was 5.3 × 10⁻⁵ g m⁻² day⁻¹, which is two orders of magnitude lower than that of a reference single-density Al₂O₃ layer. This improvement can be attributed to the location mismatch of paths in the film for atmospheric gases, such as oxygen and water, due to different layer densities. High-resolution transmission electron microscopy and x-ray photoelectron spectroscopy confirmed the multidensity layer structure’s superior characteristics as an encapsulation layer due to a location mismatch of the paths for oxidative species between the two layers.

中文翻译：

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通过空间原子层沉积制备的Al2O3多密度层结构的薄膜封装

通过空间原子层沉积而沉积的氧化铝膜已经用于有机发光二极管的薄膜封装。在这项研究中，以不同的臭氧流量沉积了由两个不同密度的Al ₂ O ₃层组成的多密度层结构。如通过水蒸气透过率（WVTR）测量所证实的，该结构改善了透湿屏障特性。多密度层结构的最低WVTR为5.3×10 ^-5 gm ^-2 day ^-1，比参考单密度Al ₂ O ₃的最低WVTR低两个数量级。层。这种改善可以归因于由于不同的层密度而导致的诸如氧气和水的大气气体的膜中路径的位置失配。高分辨率透射电子显微镜和X射线光电子能谱证实，由于两层之间氧化性物质的路径位置不匹配，因此多密度层结构作为封装层具有优越的特性。