Pulsed laser deposition is an excellent technology for growing diamond-like carbon films. It can provide sufficient ion energy at a low temperature to achieve the desired compound or doped coating during the deposition process. This review discusses the influence of the dominant laser parameters, ambient gas, and substrate-target conditions on the various properties of diamond-like carbon films by arranging the data reported in the last decade. Details of the basic and advanced pulsed laser deposition processes used to grow diamond-like carbon coatings are reviewed, and the highly adhesive diamond-like carbon film deposited by advanced pulsed laser deposition is emphasized. The excellent protective performance of diamond-like carbon films prepared by pulsed laser deposition is attributed to their high hardness, chemical inertness, low friction, and superior wear resistance, leading to applications in the fields of tribology, mechanics, medicine, and optics. Double laser beam deposition, hybrid pulsed laser deposition, and ion management in a magnetic field, which represent the development of pulsed laser deposition, are also discussed. This review is expected to offer assistance and inspiration to researchers engaged in the growth of diamond-like carbon films.

脉冲激光沉积是一种用于生长类金刚石碳膜的出色技术。它可以在低温下提供足够的离子能量，从而在沉积过程中获得所需的化合物或掺杂涂层。这篇综述通过排列最近十年报告的数据，讨论了主要的激光参数，环境气体和衬底目标条件对类金刚石碳膜各种性能的影响。综述了用于生长类金刚石碳涂层的基本和高级脉冲激光沉积工艺的细节，并强调了通过高级脉冲激光沉积沉积的高粘附性类金刚石碳膜。通过脉冲激光沉积制备的类金刚石碳膜的优异保护性能归因于其高硬度，化学惰性，低摩擦，以及优异的耐磨性，从而导致在摩擦学，力学，医学和光学领域的应用。还讨论了双激光束沉积，混合脉冲激光沉积和磁场中的离子管理，它们代表了脉冲激光沉积的发展。预期该评论将为从事类金刚石碳膜生长的研究人员提供帮助和启发。