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Evaluation of hydrogen retention behavior in tungsten exposed to hydrogen plasma in QUEST
Nuclear Materials and Energy ( IF 2.6 ) Pub Date : 2020-11-25 , DOI: 10.1016/j.nme.2020.100856
Ayaka Koike , Moeko Nakata , Shota Yamazaki , Takuro Wada , Fei Sun , Mingzhong Zhao , Naoaki Yoshida , Kazuaki Hanada , Yasuhisa Oya

The W (tungsten) samples were placed at Top, Equator and Bottom plasma facing walls of QUEST (Q-shu University Experiment with Steady-State-Spherical Tokamak) device and exposed to 754 shots of hydrogen plasma during 2017A/W (Autumn/Winter) campaign. Thereafter, their surface morphologies and chemical states were evaluated by TEM (Transmission Electron Microscope) and XPS (X-ray photoelectron spectroscopy). The XPS results showed that a thick carbon layer about 3–18 nm has formed throughout the wall surface. Among them, the Bottom wall had the deposition layer with the thickness of 2 nm, which was thinner than the top wall, namely erosion-dominated. On the other hand, a thick C layer about 18 nm was deposited on the Equator wall. The additional 1 keV D2+ was implanted into these samples and the D (deuterium) retention enhancement was estimated. The D2 TDS (Thermal Desorption Spectroscopy) spectra for all the samples had two major desorption stages at 400 K and 650 K, namely the desorption of D trapped by irradiation damages and deposition layer. The erosion/deposition profile would be caused by wall position and plasma condition, like a current start-up experiment. The desorption temperature of H2 (hydrogen) was shifted toward higher temperature side compared to that exposed to previous plasma campaign (2016 A/W), suggesting that H was mainly accumulated in the deposition layer with forming C–H bonds.



中文翻译:

在QUEST中评估暴露于氢等离子体的钨中的氢保留行为

将W(钨)样品放在QUEST(Q-shu大学的稳态态球形托卡马克实验)装置的顶,赤道和底面等离子体壁上,并在2017A / W(秋/冬)期间暴露于754张氢等离子体)广告系列。之后,通过TEM(透射电子显微镜)和XPS(X射线光电子能谱)评价其表面形态和化学状态。XPS结果表明,整个壁表面形成了大约3–18 nm的厚碳层。其中,底壁具有2nm的厚度的沉积层,该沉积层比顶壁薄,即侵蚀为主。另一方面,在赤道壁上沉积了约18 nm的厚C层。额外的1 keV D 2 +将其植入这些样品中,并估计D(氘)的保留增强。所有样品的D 2 TDS(热解吸光谱)光谱在400 K和650 K有两个主要的解吸阶段,即被辐照损伤和沉积层捕获的D的解吸。腐蚀/沉积轮廓将由壁位置和等离子体条件引起,例如当前的启动实验。与以前的等离子运动(2016 A / W)相比,H 2(氢)的解吸温度移向了较高的温度侧,这表明H主要沉积在沉积层中并形成了C–H键。

更新日期:2020-12-28
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