当前位置:
X-MOL 学术
›
arXiv.cs.ET
›
论文详情
Our official English website, www.x-mol.net, welcomes your
feedback! (Note: you will need to create a separate account there.)
Impact of Magnetic Coupling and Density on STT-MRAM Performance
arXiv - CS - Emerging Technologies Pub Date : 2020-11-23 , DOI: arxiv-2011.11349 Lizhou Wu, Siddharth Rao, Mottaqiallah Taouil, Erik Jan Marinissen, Gouri Sankar Kar, Said Hamdioui
arXiv - CS - Emerging Technologies Pub Date : 2020-11-23 , DOI: arxiv-2011.11349 Lizhou Wu, Siddharth Rao, Mottaqiallah Taouil, Erik Jan Marinissen, Gouri Sankar Kar, Said Hamdioui
As a unique mechanism for MRAMs, magnetic coupling needs to be accounted for
when designing memory arrays. This paper models both intra- and inter-cell
magnetic coupling analytically for STT-MRAMs and investigates their impact on
the write performance and retention of MTJ devices, which are the data-storing
elements of STT-MRAMs. We present magnetic measurement data of MTJ devices with
diameters ranging from 35nm to 175nm, which we use to calibrate our intra-cell
magnetic coupling model. Subsequently, we extrapolate this model to study
inter-cell magnetic coupling in memory arrays. We propose the inter-cell
magnetic coupling factor Psi to indicate coupling strength. Our simulation
results show that Psi=2% maximizes the array density under the constraint that
the magnetic coupling has negligible impact on the device's performance. Higher
array densities show significant variations in average switching time,
especially at low switching voltages, caused by inter-cell magnetic coupling,
and dependent on the data pattern in the cell's neighborhood. We also observe a
marginal degradation of the data retention time under the influence of
inter-cell magnetic coupling.
中文翻译:
磁耦合和密度对STT-MRAM性能的影响
作为MRAM的独特机制,在设计存储阵列时需要考虑磁耦合。本文对STT-MRAM的单元内和单元间磁耦合进行了建模,并研究了它们对作为STT-MRAM数据存储元素的MTJ器件的写入性能和保留的影响。我们提供了直径范围从35nm到175nm的MTJ设备的磁测量数据,这些数据用于校准细胞内磁耦合模型。随后,我们推断该模型以研究存储器阵列中的小区间磁耦合。我们提出小区间磁耦合系数Psi来指示耦合强度。我们的仿真结果表明,在磁耦合对器件性能的影响可忽略不计的约束下,Psi = 2%可使阵列密度最大化。较高的阵列密度显示出平均开关时间的显着变化,尤其是在低开关电压下,这是由单元间磁耦合引起的,并且取决于单元附近的数据模式。我们还观察到在单元间磁耦合的影响下数据保留时间的边际下降。
更新日期:2020-11-25
中文翻译:
磁耦合和密度对STT-MRAM性能的影响
作为MRAM的独特机制,在设计存储阵列时需要考虑磁耦合。本文对STT-MRAM的单元内和单元间磁耦合进行了建模,并研究了它们对作为STT-MRAM数据存储元素的MTJ器件的写入性能和保留的影响。我们提供了直径范围从35nm到175nm的MTJ设备的磁测量数据,这些数据用于校准细胞内磁耦合模型。随后,我们推断该模型以研究存储器阵列中的小区间磁耦合。我们提出小区间磁耦合系数Psi来指示耦合强度。我们的仿真结果表明,在磁耦合对器件性能的影响可忽略不计的约束下,Psi = 2%可使阵列密度最大化。较高的阵列密度显示出平均开关时间的显着变化,尤其是在低开关电压下,这是由单元间磁耦合引起的,并且取决于单元附近的数据模式。我们还观察到在单元间磁耦合的影响下数据保留时间的边际下降。