Erosion of material by energetic ions, i.e., sputtering, is widely used in industry and research. Using experiments and simulations that, independently of each other, obtain the sputter yield of thousands of individual grains, we demonstrate here that the sputter yield for heavy keV ions on metals changes as a continuous function of the crystal direction. Moreover, we show that polycrystalline metals with randomly oriented grains do not sputter with the same yield as the amorphous material. The key reason for this is attributed to linear collision sequences rather than channeling.

中文翻译：

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缺少与非晶态材料对应的晶体方向制度

高能离子对材料的侵蚀，即溅射，在工业和研究中被广泛使用。使用彼此独立地获得数千个单个晶粒的溅射产率的实验和模拟，我们在此处证明了金属上重keV离子的溅射产率随晶体方向的连续函数而变化。此外，我们表明具有随机取向晶粒的多晶金属不会以与非晶材料相同的产率溅射。这样做的关键原因是线性碰撞序列，而不是通道。