Abstract Nd-Fe-B thin films have been successfully developed by Pulsed Laser Deposition (PLD) onto silicon substrates. In order to explore the crucial role of target composition during PLD, five single alloy targets, representing specific atomic compositions (Nd/Fe atomic ratio varied in the range 0.18–0.47) have been tested and studied. In a determined deposition temperature range of 550°C-630°C, thin films made from a target with Nd/Fe=0.45 present the best hard magnetic properties, a quasi-single magnetic phase, both coercivity and remanence above 1 T and a square loop shape. FIB-EBS analyses associated with XRD, SEM and SQUID magnetic measurements indicate that the high values of both remanent magnetization and coercivity are ascribed to film texturation and to partial decoupling of the hard magnetic Nd2Fe14B grains by a secondary Nd-rich phase. PLD performed with other target compositions and non-optimized deposition temperatures leads to poorer magnetic properties, owing to the presence of soft magnetic phase and non-textured or oxidized thin films.

中文翻译：

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单合金靶材脉冲激光沉积制备织构Nd-Fe-B硬磁薄膜

摘要 Nd-Fe-B 薄膜已通过脉冲激光沉积 (PLD) 成功地开发到硅衬底上。为了探索靶成分在 PLD 过程中的关键作用，已经测试和研究了五种代表特定原子成分（Nd/Fe 原子比在 0.18-0.47 范围内变化）的单一合金靶。在 550°C-630°C 的确定沉积温度范围内，由 Nd/Fe=0.45 的靶材制成的薄膜呈现出最好的硬磁性能、准单磁相、矫顽力和剩磁均高于 1 T 和方环形状。与 XRD 相关的 FIB-EBS 分析，SEM 和 SQUID 磁性测量表明，残余磁化强度和矫顽力的高值归因于薄膜结构和硬磁 Nd2Fe14B 晶粒通过二次富 Nd 相的部分解耦。由于软磁相和非织构化或氧化薄膜的存在，使用其他靶材组合物和未优化的沉积温度进行的 PLD 会导致较差的磁性能。