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Residual stress determination in thin films by X-ray diffraction and the widespread analytical practice applying a biaxial stress model: An outdated oversimplification?
Applied Surface Science ( IF 6.3 ) Pub Date : 2021-03-01 , DOI: 10.1016/j.apsusc.2020.148531
Peter Schoderböck , Harald Köstenbauer

Abstract Compressive stresses are commonly desired in thin films and the stress state in layers and coatings is in general evaluated assuming a biaxial nature of stress. But how thin is thick enough, or how many atom layers are necessary until this model assumption fails and a hydrostatic term joins in? In order to provide an answer molybdenum has been magnetron sputtered on display glass in layer thicknesses from 100 nm up to 2000 nm and afterwards investigated by X-ray diffraction to determine the residual stress state in the [1 1 0] fiber-textured sputtered films. It will be demonstrated that the use of a biaxial stress model might only be justified for thin layers if at all.

中文翻译:

通过 X 射线衍射确定薄膜中的残余应力和应用双轴应力模型的广泛分析实践:过时的过度简化?

摘要 薄膜通常需要压缩应力,层和涂层中的应力状态通常在假设应力的双轴性质的情况下进行评估。但是多薄才足够厚,或者在这个模型假设失败并且流体静力项加入之前需要多少原子层?为了提供答案,钼已被磁控溅射在显示器玻璃上,层厚从 100 nm 到 2000 nm,然后通过 X 射线衍射进行研究以确定 [1 1 0] 纤维织构溅射薄膜中的残余应力状态. 将证明双轴应力模型的使用可能仅适用于薄层,如果有的话。
更新日期:2021-03-01
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