In this study, Bi 4− x Nd x Ti 3 O 12 (BNdT), in which neodymium is substituted into Bi 4 Ti 3 O12 (BiT) with a bismuth layer-structured ferroelectrics (BLSFs) structure, was deposited on a Pt/Ti/SiO 2 /Si substrate by using pulsed laser deposition (PLD). The BNdT film is known to exhibit structural and electrical anisotropy with the reported maximum spontaneous polarization ( P s ) along the a axis (∼55 μC/cm 2 )and the c axis (−5 μC/cm 2 ). The ability of BNdT to control the structural change with growth orientation is key to its enhanced properties. In a PLD system, a few important factors, such as deposition temperature, oxygen pressure, and energy fluence, are responsible for the structural variation. We aimed to enhance the structural properties of polycrystalline BNdT film, so we investigated the change in the orientation of BNdT film according to PLD deposition conditions. To identify the mechanism of structural change according to deposition conditions, we used X-ray diffraction to analyze the film’s orientation and to calculate the lattice constants and the crystallite size. We also used field emission scanning electron microscopy (FE-SEM) to assess the surface morphology and the grain shape of the BNdT films.

中文翻译：

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沉积参数对使用脉冲激光沉积合成的高各向异性 Bi4-x Ndx Ti3O12 薄膜结构性能的影响

在这项研究中，Bi 4− x Nd x Ti 3 O 12 (BNdT)，其中钕被取代成具有铋层结构铁电体 (BLSF) 结构的 Bi 4 Ti 3 O12 (BiT)，沉积在 Pt/通过使用脉冲激光沉积 (PLD) Ti/SiO 2 /Si 衬底。已知 BNdT 膜表现出结构和电各向异性，据报道最大自发极化 (P s ) 沿 a 轴 (~55 μC/cm 2 ) 和 c 轴 (-5 μC/cm 2 )。BNdT 控制结构随生长方向变化的能力是其增强性能的关键。在 PLD 系统中，一些重要因素，如沉积温度、氧气压力和能量注量，是造成结构变化的原因。我们旨在增强多晶BNdT薄膜的结构性能，因此，我们根据 PLD 沉积条件研究了 BNdT 薄膜的取向变化。为了根据沉积条件确定结构变化的机制，我们使用 X 射线衍射来分析薄膜的取向并计算晶格常数和微晶尺寸。我们还使用场发射扫描电子显微镜 (FE-SEM) 来评估 BNdT 薄膜的表面形态和晶粒形状。