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Research on the fabrication and anti-reflection performance of diamond-like carbon films
Diamond and Related Materials ( IF 4.3 ) Pub Date : 2021-01-01 , DOI: 10.1016/j.diamond.2020.108184
Qinru Yang , Song He , Ruiming Huang , Meng Yu , Cao Chen , Songsheng Zheng , Daqin Yun , Lingling Zheng , Qijin Cheng

Abstract In this work, a radio-frequency plasma-enhanced chemical vapor deposition (RF-PECVD) system has been employed to fabricate diamond-like carbon (DLC) films for the application in crystalline silicon solar cells. The morphological, structural and optical properties of the synthesised DLC films were investigated under different deposition times, different plasma discharge powers, different CH4 flow rates, and different substrate temperatures, respectively. It is shown that, when the plasma discharge power was 100 W, the CH4 flow rate was 60 sccm, and the substrate temperature was 100 °C, the synthesised DLC film features a high transmittance of 95%, a low surface reflectivity of approximately 14%, a wide optical band gap of 2.6 eV, as well as a uniform and dense texture. Subsequently, the DLC films with different thicknesses were grown on the surface of crystalline silicon solar cells as anti-reflection coatings. The solar cell current-voltage characteristic testing system was used to investigate the change of solar cell performance parameters, i.e., Jsc, Voc, FF and η. After the growth of a DLC film with a deposition time of 20 min on the surface of a crystalline silicon solar cell, the photovoltaic conversion efficiency of the solar cell increases from 4.12% to 5.2%. This work demonstrates that the DLC film has a promising application potential as an anti-reflection layer in crystalline silicon solar cells.

中文翻译:

类金刚石碳膜的制备及减反射性能研究

摘要 在这项工作中,采用射频等离子体增强化学气相沉积 (RF-PECVD) 系统制备类金刚石碳 (DLC) 薄膜,用于晶体硅太阳能电池。分别在不同沉积时间、不同等离子体放电功率、不同 CH4 流速和不同衬底温度下研究了合成的 DLC 薄膜的形态、结构和光学特性。结果表明,当等离子体放电功率为 100 W、CH4 流量为 60 sccm、衬底温度为 100 °C 时,合成的 DLC 薄膜具有 95% 的高透光率,低表面反射率约为 14 %,2.6 eV 的宽光学带隙,以及均匀致密的纹理。随后,在晶体硅太阳能电池表面生长不同厚度的DLC薄膜作为减反射涂层。太阳能电池电流-电压特性测试系统用于研究太阳能电池性能参数Jsc、Voc、FF和η的变化。在晶体硅太阳能电池表面生长沉积时间为20 min的DLC薄膜后,太阳能电池的光伏转换效率从4.12%提高到5.2%。这项工作表明,DLC 薄膜作为晶体硅太阳能电池中的抗反射层具有广阔的应用潜力。FF 和 η。在晶体硅太阳能电池表面生长沉积时间为20 min的DLC薄膜后,太阳能电池的光伏转换效率从4.12%提高到5.2%。这项工作表明,DLC 薄膜作为晶体硅太阳能电池中的抗反射层具有广阔的应用潜力。FF 和 η。在晶体硅太阳能电池表面生长沉积时间为20 min的DLC薄膜后,太阳能电池的光伏转换效率从4.12%提高到5.2%。这项工作表明,DLC 薄膜作为晶体硅太阳能电池中的抗反射层具有广阔的应用潜力。
更新日期:2021-01-01
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