The ablation threshold fluence and crater morphology of amorphous and crystalline SiO₂ glass were analyzed in the regime of an extreme ultraviolet femtosecond pulse. Despite the difference between the densities (or optical penetration depths) of amorphous and crystalline SiO₂ glass, the ablation threshold fluences and crater morphologies were found to be comparable. In addition, we compared our experimental results at a 10.3nm wavelength with those in a previous work at a 13.5 nm wavelength. We conclude that the impact of the difference in density or optical penetration depth of several tens of percent on the ablation process is limited.

中文翻译：

---

极紫外飞秒脉冲的非晶和结晶SiO ₂玻璃的烧蚀阈值和坑口形态

在极紫外飞秒脉冲的范围内，分析了非晶和结晶SiO ₂玻璃的烧蚀阈值通量和火山口形态。尽管非晶态和结晶态SiO ₂玻璃的密度（或光学穿透深度）之间存在差异，但发现烧蚀阈值通量和火山口形貌可比。另外，我们将我们在10.3nm波长处的实验结果与先前工作中在13.5nm波长处的实验结果进行了比较。我们得出的结论是，密度差异或百分之几十的光学穿透深度对消融过程的影响是有限的。