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Study on Electroless Plating Ni-W-P Ternary Alloy with High Tungsten from Compound Complexant Bath
Journal of Materials Engineering and Performance ( IF 2.2 ) Pub Date : 2020-11-16 , DOI: 10.1007/s11665-020-05312-9
Wenchang Wang , Xin Jü , Chengyi Xu , Weiwei Zhang , Naotoshi Mitsuzaki , Zhidong Chen

The Ni-W-P alloy coatings have been widely used in the fields of electronic, aviation and anticorrosion, owing to their high hardness, good wear resistance and strong corrosion resistance. Herein, we study the effects of complexants on the chemical composition, morphology and plating rate of the Ni-W-P ternary alloy coatings by developing a near-neutral plating solution with disodium edetate, sodium citrate and lactic acid as complex complexants. The results of scanning electron microscope (SEM) and energy-dispersive spectrometer (EDS) indicate that a flat and dense coating with the W content up to 11.75 wt.% is acquired by adjusting the composition of plating solution. Meanwhile, the plating rate of Ni-W-P coating can reach up to 22.4 µm/h. Furthermore, the characterization results indicate that the Ni-W-P ternary alloy coating possesses higher hardness, better wear and corrosion resistance compared to Ni-P coating. These findings may exploit a broader field for searching better complexants in electroless coating and for understanding the related mechanisms to provide guidance for the design of ternary alloy coatings.



中文翻译:

复合配位液中高钨化学镀Ni-WP三元合金的研究

Ni-WP合金涂层由于其高硬度,良好的耐磨性和强的耐腐蚀性而被广泛用于电子,航空和防腐领域。在本文中,我们通过开发以乙二胺四乙酸二钠,柠檬酸钠和乳酸为络合剂的近中性镀液,研究了络合剂对Ni-WP三元合金镀层化学成分,形态和镀覆速率的影响。扫描电子显微镜(SEM)和能量分散光谱仪(EDS)的结果表明,通过调节镀液的组成,可以获得W含量高达11.75重量%的平坦且致密的涂层。同时,Ni-WP镀层的镀覆速度可达到22.4 µm / h。此外,表征结果表明,与Ni-P涂层相比,Ni-WP三元合金涂层具有更高的硬度,更好的耐磨性和耐腐蚀性。这些发现可能会开拓更广阔的领域,以寻找化学镀层中更好的络合物,并了解相关机理,为三元合金镀层的设计提供指导。

更新日期:2020-11-17
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