We present theoretical investigations on designing a simple double nano-slit superlens for dramatically improving imaging quality for advanced plasmonic photolithography through introducing graphene as a plasmonic integrator. It is proposed that more than 235 times enhancement of localized electric field can be assured as the graphene layer is embedded in the designed superlens. It is observed that by introducing graphene for superlensing, dominant enhancement of electric field amplitudes of interference imaging profiles can be observed at a properly designed photoresist with optimal thickness. We further show by systematically examining design parameters for the graphene-based superlens, clarifying the overall geometric and material parameter influences on the plasmonic imaging pattern characteristics. The results are attributed to the unique role of graphene participating in strong hybrid plasmonic cavity coupling modes for supporting localized electric fields of the nanoslit superlensing. This study shows proper designing of graphene-based optical superlens can potentially realize high-quality, low-cost and simple-realized nano-imaging for advanced plasmonic photolithography applications.

中文翻译：

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通过基于石墨烯的纳米狭缝光学超级透镜进行等离子体成像的巨大电场增强

我们提出了设计简单的双纳米缝超级透镜的理论研究，通过引入石墨烯作为等离子体积分器，显着提高先进等离子体光刻的成像质量。建议将石墨烯层嵌入设计的超级透镜中，可以确保局部电场增强 235 倍以上。观察到，通过引入石墨烯用于超透镜，可以在适当设计的具有最佳厚度的光刻胶处观察到干涉成像轮廓的电场幅度的显着增强。我们通过系统地检查基于石墨烯的超级透镜的设计参数进一步展示，阐明了整体几何和材料参数对等离子体成像图案特征的影响。结果归因于石墨烯参与强混合等离子体腔耦合模式以支持纳米狭缝超透镜的局部电场的独特作用。这项研究表明，基于石墨烯的光学超级透镜的适当设计有可能为先进的等离子体光刻应用实现高质量、低成本和简单实现的纳米成像。