A model for calculating the X‐ray reflectivity (XRR) of surfaces to extract both roughness and waviness features is presented. Expressions of reflectivity intensity are derived as a function of root‐mean‐square (RMS) roughness σ, RMS waviness σ_L, and the cut‐off frequency between the features ω₀. Experiments were conducted at the Advanced Light Source at Lawrence Berkeley National Laboratory, beamline 8.3.2, on BK7 glass manufactured with a multi‐step polishing process to validate the model, and were compared with atomic force microscopy (AFM), Fizeau interferometry and surface profilometry measurements. The parameter results and their deviations for XRR measurements were σ = 2.9 ± 0.2 nm and σ_L = 14.6 ± 0.5 nm with a wavelength cut‐off of 1/(18 ± 2) µm⁻¹, while the results from the AFM, Fizeau and profilometry measurements were σ_AFM = 3.4 ± 0.4 nm, σ_L,Fizeau = 21.6 nm, σ_prof = 4.0 ± 0.1 nm, and σ_L,prof = 21.4 ± 0.1 nm with cut‐offs for the profilometry and Fizeau measurements limited to frequencies of (1/16) µm⁻¹ to (1/4) mm⁻¹.

中文翻译：

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更长的波纹度对X射线反射率测量的影响

提出了用于计算表面的X射线反射率（XRR）以提取粗糙度和波纹度特征的模型。反射强度的表达式推导为根均方（RMS）粗糙度σ，RMS波度σ的函数_大号和截止的特征之间的频率ω ₀。实验是在劳伦斯伯克利国家实验室的高级光源束线8.3.2上进行的，采用多步抛光工艺制造的BK7玻璃可以验证模型，并与原子力显微镜（AFM），菲索干涉仪和表面进行了比较。轮廓测量法。该参数结果及其偏差XRR测量结果σ= 2.9±0.2 nm和σ_大号= 14.6±0.5纳米的波长截止的1 /（18±2）微米^-1，而从AFM的结果，斐索和轮廓测量结果σ _AFM = 3.4±0.4纳米，σ_{大号，斐索}= 21.6纳米，σ_教授 = 4.0±0.1纳米，和σ_{大号，教授}= 21.4±0.1 nm的轮廓测定法和Fizeau测量的截止值限制为（1/16）µm ^-1至（1/4）mm ^-1的频率。