Vacuum evaporation technology was applied to fabricate Pb_0.9Cd_0.1Te:Pb (3 at.%) thin films on glass and polycrystalline silicon substrates. X-ray diffraction analysis confirms the rock salt structure with the (100) preferred growing direction for the investigated films. The formation of films on an amorphous glass substrate occurs by two consecutive growth mechanisms. The Volmer–Weber mechanism is the initial mechanism, and it gradually changes with the Frank–van der Merve mechanism. On the polycrystalline silicon substrate, the Volmer–Weber growth mechanism is dominant. Surface formations are oriented and needle-like. A complex of thermodynamic parameters: the enthalpy of formation, entropy, Gibbs free energy, and heat capacity were calculated using the estimated crystallographic data. This work brings light on the fabrication process of single-phase Pb_0.9Cd_0.1Te:Pb (3 at.%) thin films with a high-quality surface using the low-cost and simple vacuum evaporation method.

应用真空蒸发技术制备Pb _0.9 Cd _0.1在玻璃和多晶硅基板上的Te​​：Pb（3 at。％）薄膜。X射线衍射分析证实了所研究的膜具有（100）优先生长方向的岩盐结构。在非晶玻璃基板上的膜的形成通过两个连续的生长机理发生。Volmer-Weber机制是初始机制，随着Frank-van der Merve机制而逐渐变化。在多晶硅衬底上，Volmer–Weber生长机制占主导地位。表面构造是定向的并且是针状的。使用估算的晶体学数据计算出复杂的热力学参数：形成焓，熵，吉布斯自由能和热容。这项工作为单相Pb _0.9 Cd的制造工艺提供了启示使用低成本和简单的真空蒸发方法，可制得具有高质量表面的_0.1 Te：Pb（3 at。％）薄膜。