A method of photochemical subnano-polishing of a quartz surface covered with NaClO solution is considered when the lighting is produced from the quartz side at an angle that provides the total internal reflection of light. It was found the use of the effect of total internal reflection of light significantly enhances the electric field near the quartz surface with a sinusoidal profile (about three times) compared with direct illumination of such a surface under the normal incidence of light from the side of the solution. It has also been shown that for a random profile with a Gaussian correlation function at the initial stage of polishing, the etching of the components of the profile spatial spectrum located near the maximum of the spectral function derivative, as well as in the frequency region having resonance with the incident wave, occurs most intensively.

中文翻译：

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光化学抛光过程中石英表面空间光谱特性对场对比度影响的理论分析

当从石英侧以提供光的全内反射的角度产生照明时，考虑使用光化学亚纳米抛光方法对覆盖有 NaClO 溶液的石英表面进行光化学亚纳米抛光。发现使用光的全内反射效应显着增强了具有正弦曲线的石英表面附近的电场（约三倍）与在光从侧面的法向入射下直接照射这种表面相比。解决方案。还表明，对于在抛光初始阶段具有高斯相关函数的随机轮廓，轮廓空间频谱分量的蚀刻位于频谱函数导数的最大值附近，以及在具有与入射波共振，