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Order-disorder behavior at thin film oxide interfaces
Current Opinion in Solid State & Materials Science ( IF 12.2 ) Pub Date : 2020-11-07 , DOI: 10.1016/j.cossms.2020.100870
Steven R. Spurgeon

Order-disorder processes fundamentally determine the structure and properties of many important oxide systems for energy and computing applications. While these processes have been intensively studied in bulk materials, they are less investigated and understood for nanostructured oxides in highly non-equilibrium conditions. These systems can now be realized through a range of deposition techniques and probed at exceptional spatial and chemical resolution, leading to a greater focus on interface dynamics. Here we survey a selection of recent studies of order-disorder behavior at thin film oxide interfaces, with a particular emphasis on the emergence of order during synthesis and disorder in extreme irradiation environments. We summarize key trends and identify directions for future study in this growing research area.



中文翻译:

薄膜氧化物界面上的有序行为

有序无序过程从根本上决定了许多重要的氧化物体系的结构和性能,这些体系在能源和计算应用中都非常重要。尽管已对散装材料进行了深入研究,但在高度非平衡条件下对纳米结构氧化物的研究和了解却较少。这些系统现在可以通过一系列的沉积技术来实现,并以出色的空间和化学分辨率进行探测,从而更加关注界面动力学。在这里,我们调查了薄膜氧化物界面上有序-无序行为的最新研究成果,特别强调了在极端辐射环境下合成和无序过程中有序的出现。我们总结了这一主要趋势,并确定了这个不断发展的研究领域中未来研究的方向。

更新日期:2020-11-09
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