In this probe, enhanced photocatalytic reduction of mercuric cations has been achieved endorsing a novel mesoporous BiFeO₃/g-C₃N₄ heterojunction accommodating various percentages of BiFeO₃ nanoparticles (NPs) under Vis light irradiation. Formic acid was adopted as holes sacrificial correlated with pure g-C₃N₄ nanosheet or BiFeO₃ nanoparticles. BiFeO₃ NPs of particle dimension of 4–6 nm were homogeneously spread over the surface of the g-C₃N₄ nanosheet. The superior photocatalytic reduction of mercuric cations endorsing BiFeO₃/g-C₃N₄ heterojunction has been affirmed since enlarging the dopant content (BiFeO₃ NPs) from 1 up to 4% brings about an enhancement in the efficacy of the photocatalytic reduction of mercuric cations(Hg) from 38 up to 88% after 1 h of illumination. Obviously, the rate of the photocatalytic removal of mercuric cations endorsing mesoporous BiFeO₃/g-C₃N₄ heterojunction accommodating 4% BiFeO₃ NPs was found to be 5.3 and 7.9 times larger when correlated to those of neat BiFeO₃ NPs and g-C₃N₄ nanosheet, accordingly. The superior photocatalytic reduction of mercuric cations under Vis light irradiation via adopting the synthesized BiFeO₃/g-C₃N₄ heterojunction could be appropriated to the very finite particle sizes of BiFeO₃ NPs in addition to their excellent dispersion over the g-C₃N₄ nanosheet surface. Besides, the extensive area, little band gap, and the excellent crystallinity of the synthesized photocatalyst are considered crucial aspects in the photocatalytic achievement of the synthesized BiFeO₃/g-C₃N₄ heterojunction. Interestingly, the stability of the synthesized BiFeO₃/g-C₃N₄ heterojunction towards the photocatalytic reduction of mercuric cations has been affirmed via recycling the photocatalyst up to five runs without pronounced loss in the photocatalytic performance towards mercuric cations reduction. In conclusion, the attained data brings about establishing a novel photocatalyst of Z-scheme type that could be successfully applied for photocatalytic remediation of toxic contaminants under Vis light irradiation.

在该探针中，已证实了新型的介孔BiFeO ₃ / gC ₃ N ₄异质结可容纳可见百分数的BiFeO ₃纳米颗粒（NPs），并在可见光照射下实现了汞阳离子的光催化还原。采用甲酸作为与纯gC ₃ N ₄纳米片或BiFeO ₃纳米粒子相关的牺牲孔。粒径为4–6 nm的BiFeO ₃ NP均匀分布在gC ₃ N ₄纳米片的表面上。支持BiFeO ₃ / gC ₃的汞阳离子的优异光催化还原N ₄异质结已得到确认，因为在照射1小时后，将掺杂剂含量（BiFeO ₃ NPs）从1增加到4％可使汞阳离子（Hg）的光催化还原效率从38增加到88％。 。显然，与包含纯BiFeO ₃ NP和gC ₃ N ₄的汞相关，支持中孔BiFeO ₃ / gC ₃ N ₄容纳4％BiFeO ₃ NP的异质结的汞阳离子的光催化去除速率分别为5.3和7.9倍。纳米片，因此。通过采用合成的BiFeO ₃ / gC ₃ N ₄异质结，在Vis光照射下汞阳离子的优异光催化还原性能，不仅适用于BiFeO ₃ NP的非常有限的粒径，而且还可以在gC ₃ N ₄纳米片表面上很好地分散。。此外，合成的光催化剂的面积大，带隙小和优异的结晶度被认为是合成的BiFeO ₃ / gC ₃ N ₄异质结光催化实现的关键方面。有趣的是，合成的BiFeO ₃的稳定性通过使光催化剂循环多达五次运行，证实了对汞阳离子的光催化还原的/ gC ₃ N ₄异质结，而对汞阳离子还原的光催化性能没有明显损失。总之，获得的数据带来了建立一种新型的Z-方案光催化剂，该光催化剂可以成功地用于Vis光照射下光催化修复有毒污染物。