We have fabricated a blazed x-ray reflection grating with a period of 160 nm using thermally activated selective topography equilibration (TASTE) and electron-beam (ebeam) physical vapor evaporation. TASTE makes use of grayscale ebeam lithography to create three-dimensional (3-D) structures in resist, which can then be thermally reflown into a desired profile. A blazed grating profile can be fabricated by selectively reflowing a periodic staircase structure into a wedge. This was done for the first time at a grating period of 160 nm, 2.5 times smaller than previous x-ray gratings fabricated using TASTE. The grating was patterned over a 10 mm by 60 mm area in a 147-nm-thick layer of poly(methyl methacrylate) resist and coated with 5 nm of chromium and 15 nm of gold using ebeam evaporation. The diffraction efficiency of the grating was measured using beamline 6.3.2 at Lawrence Berkeley National Laboratory’s Advanced Light Source. The results show a total absolute diffraction efficiency ≳40 % at lower energies, with maximum single-order diffraction efficiency ranging from 20% to 40%. The total diffraction efficiency was ≳30 % across the measured bandpass of 180 to 1300 eV.

中文翻译：

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使用热激活选择性形貌平衡法制造的小周期天文X射线反射光栅的衍射效率

我们使用热激活选择性形貌平衡（TASTE）和电子束（ebeam）物理气相蒸发法制造了周期为160 nm的闪耀X射线反射光栅。TASTE利用灰度电子束光刻技术在抗蚀剂中创建三维（3-D）结构，然后可以将其热回流成所需的轮廓。可以通过有选择地将周期性阶梯结构回流到楔形中来制造闪耀的光栅轮廓。这是第一次以160 nm的光栅周期完成的，比使用TASTE制造的以前的X射线光栅小2.5倍。在厚度为147 nm的聚（甲基丙烯酸甲酯）抗蚀剂层中的10 mm x 60 mm区域上对光栅进行构图，并使用电子束蒸发法在其中涂覆5 nm铬和15 nm金。光栅的衍射效率是使用劳伦斯·伯克利国家实验室的Advanced Light Source中的光束线6.3.2测量的。结果表明，在较低能量下，总绝对衍射效率约为40％，最大单级衍射效率为20％至40％。在180至1300 eV的整个带通量范围内，总衍射效率为≳30％。