Abstract We report a systematic study of cuprous oxide (Cu2O) films prepared on glass substrates via radio frequency reactive magnetron sputtering at room temperature. We consider the effects of the target power and film thickness on film structures, morphologies, and optical properties. X-ray diffraction indicates significant changes from an amorphous film to a paramelaconite film and then to a cuprite film as the sputtering power increases. Increasing the sputtering power also contributes to variation in the surface roughness of the film. The optical transmittances and bandgaps of the films change with the crystalline structure. The film with a cuprite structure obtained using 60 W of sputtering power exhibits the preferred cuprite orientation (111) with an average roughness of 2.6 nm. This corresponds to an average transmittance of 73% in the 500-1000 nm range and a bandgap of 2.48 eV. The optimized Cu2O thin film exhibits excellent UV- and blue-light shielding capabilities and high optical transparency in the visible-light region. This suggests possible applications in radiation-proof windows and glasses.

中文翻译：

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溅射功率对氧化亚铜薄膜结构及蓝光屏蔽能力的影响

摘要 我们报告了在室温下通过射频反应磁控溅射在玻璃基板上制备氧化亚铜 (Cu2O) 薄膜的系统研究。我们考虑了目标功率和薄膜厚度对薄膜结构、形态和光学特性的影响。X 射线衍射表明，随着溅射功率的增加，从无定形膜到紫铜矿膜，然后再到赤铜矿膜的显着变化。增加溅射功率也有助于薄膜表面粗糙度的变化。薄膜的透光率和带隙随着晶体结构的变化而变化。使用 60 W 溅射功率获得的具有赤铜矿结构的薄膜表现出优选的赤铜矿取向 (111)，平均粗糙度为 2.6 nm。这对应于 500-1000 nm 范围内 73% 的平均透射率和 2.48 eV 的带隙。优化后的 Cu2O 薄膜在可见光区域表现出优异的紫外线和蓝光屏蔽能力以及高光学透明度。这表明在防辐射窗户和玻璃中的可能应用。