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CPLD-Based Displacement Measurement System for Nanoscale Grating Ruler
Journal of Chemistry ( IF 2.8 ) Pub Date : 2020-11-03 , DOI: 10.1155/2020/5142892 Jiyuan Sun 1, 2, 3 , Chunlin Tian 1, 4, 5
Journal of Chemistry ( IF 2.8 ) Pub Date : 2020-11-03 , DOI: 10.1155/2020/5142892 Jiyuan Sun 1, 2, 3 , Chunlin Tian 1, 4, 5
Affiliation
With the continuous development of science and technology, industrial production has higher and higher requirements for precision. Many high-precision measurement technologies emerge as the times require, and nanoscale grating ruler displacement measurement technology is one of them. As a kind of precision sensor, nanoscale grating ruler has important application in displacement measurement system. CPLD has the advantages of high integration and fast programming speed, which is often used to control the displacement measurement system of nanoscale grating ruler. The purpose of this paper is to deeply explore the measurement effect and related application principle of nanoscale grating ruler displacement measurement system based on CPLD technology. A set of nanoscale grating ruler displacement measurement system is designed based on CPLD technology. The output signal of grating ruler is programmed by CPLD. The x-axis displacement of the experimental platform controlled by stepping motor is measured, and the measured data are recorded by carrying out analysis and research. The results show that compared with the traditional phase difference measurement system, the measurement accuracy of the system based on CPLD is improved by 24.7%, the robustness of the measurement system is improved by 18.6%, and the measurement speed is increased by 27.3%. Therefore, this kind of nanoscale measurement precision grating ruler displacement measurement control system based on CPLD has three characteristics: high measurement accuracy, strong anti-interference ability, and high measurement motion efficiency, which can effectively meet the requirements of grating ruler displacement measurement system for high-precision manufacturing technology.
中文翻译:
基于 CPLD 的纳米光栅尺位移测量系统
随着科学技术的不断发展,工业生产对精度的要求越来越高。许多高精度测量技术应运而生,纳米光栅尺位移测量技术就是其中之一。纳米光栅尺作为一种精密传感器,在位移测量系统中有着重要的应用。CPLD具有集成度高、编程速度快等优点,常用于控制纳米光栅尺位移测量系统。本文旨在深入探讨基于CPLD技术的纳米光栅尺位移测量系统的测量效果及相关应用原理。设计了一套基于CPLD技术的纳米光栅尺位移测量系统。光栅尺的输出信号由CPLD编程。对步进电机控制的实验平台x轴位移进行测量,并通过分析研究记录测量数据。结果表明,与传统相位差测量系统相比,基于CPLD的系统测量精度提高了24.7%,测量系统的鲁棒性提高了18.6%,测量速度提高了27.3%。因此,这种基于CPLD的纳米级测量精密光栅尺位移测量控制系统具有测量精度高、抗干扰能力强、测量运动效率高等三大特点,
更新日期:2020-11-03
中文翻译:
![](https://scdn.x-mol.com/jcss/images/paperTranslation.png)
基于 CPLD 的纳米光栅尺位移测量系统
随着科学技术的不断发展,工业生产对精度的要求越来越高。许多高精度测量技术应运而生,纳米光栅尺位移测量技术就是其中之一。纳米光栅尺作为一种精密传感器,在位移测量系统中有着重要的应用。CPLD具有集成度高、编程速度快等优点,常用于控制纳米光栅尺位移测量系统。本文旨在深入探讨基于CPLD技术的纳米光栅尺位移测量系统的测量效果及相关应用原理。设计了一套基于CPLD技术的纳米光栅尺位移测量系统。光栅尺的输出信号由CPLD编程。对步进电机控制的实验平台x轴位移进行测量,并通过分析研究记录测量数据。结果表明,与传统相位差测量系统相比,基于CPLD的系统测量精度提高了24.7%,测量系统的鲁棒性提高了18.6%,测量速度提高了27.3%。因此,这种基于CPLD的纳米级测量精密光栅尺位移测量控制系统具有测量精度高、抗干扰能力强、测量运动效率高等三大特点,