In this study, selective optical properties of Si/SiO2 thin films and their dependence on heat treatment were investigated. Samples were synthesized by pulsed-laser ablation deposition of c-Si on glass substrates and annealed at different temperatures (400 °C, 1000 °C). Nanofabrication parameters were chosen to produce significantly different nanostructures ranging from agglomerated particles to nanofibers. Morphology, crystalline, and elemental characterization techniques were employed to explore the variations in visible range reflection measurements. The adverse effect of annealing temperatures on Vis-range reflection spectra to increase and decrease the intensity was confirmed. These improvements are attributed to crystalline and amorphous lattice structures and elemental composition supported by the X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) method results.

在这项研究中，研究了Si / SiO2薄膜的选择性光学特性及其对热处理的依赖性。通过在玻璃基板上进行脉冲激光烧蚀c-Si合成样品，并在不同温度（400°C，1000°C）下退火。选择纳米加工参数以产生从团聚颗粒到纳米纤维的明显不同的纳米结构。形态，晶体和元素表征技术被用于探索可见光范围反射测量的变化。证实了退火温度对可见区反射光谱增加和降低强度的不利影响。