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Effect of tungsten doping on laser ablation and graphitization of diamond-like nanocomposite films
Optics & Laser Technology ( IF 4.6 ) Pub Date : 2020-11-03 , DOI: 10.1016/j.optlastec.2020.106683
M.S. Komlenok , N.R. Arutyunyan , C. Freitag , E.V. Zavedeev , A.D. Barinov , M.L. Shupegin , S.M. Pimenov

Laser surface microstructuring of diamond-like nanocomposite (DLN) films is a promising technique to improve their properties. For industrial applications, UV excimer or IR lasers with high pulse repetition rate are commonly used. In this paper, we investigate the influence of metal (tungsten) doping of DLN film on the ablation and graphitization behavior of the films using KrF laser (λ = 248 nm, τ = 20 ns) and Yb:Yag laser (λ = 1030 nm, τ = 8 ps). The response is found to be sensitive to the laser wavelength and pulse duration. For UV ns-pulses, the ablation threshold is insensitive to W-doping, showing only a slight increase for the highest tungsten concentration of 27 at.%, while the ablation rate decreases. Conversely, an increase of tungsten content in the case of the irradiation by IR ps-pulses induces a drop in the ablation threshold and an increase in the ablation rate. The structural modification of the films is analyzed by Raman spectroscopy, which also allows us to estimate the thickness of a residual graphitized layer on the surface after laser irradiation. It is found that laser-induced graphitization is stronger for doped DLN films after multipulse irradiation.



中文翻译:

钨掺杂对类金刚石纳米复合薄膜激光烧蚀和石墨化的影响

类金刚石纳米复合材料(DLN)膜的激光表面微结构化是一种有望改善其性能的技术。对于工业应用,通常使用具有高脉冲重复率的UV准分子或IR激光器。在本文中,我们研究了使用KrF激光(λ= 248 nm,τ= 20 ns)和Yb:Yag激光(λ= 1030 nm)对DLN膜的金属(钨)掺杂对膜的烧蚀和石墨化行为的影响。 ,τ= 8 ps)。发现该响应对激光波长和脉冲持续时间敏感。对于紫外ns脉冲,烧蚀阈值对W掺杂不敏感,对于最高钨浓度27 at。%而言,烧蚀阈值仅略有增加,而烧蚀率却降低。反过来,在IR ps脉冲照射的情况下,钨含量的增加会引起烧蚀阈值的降低和烧蚀速率的增加。通过拉曼光谱分析膜的结构改性,这也使我们能够估计激光照射后表面上残留的石墨化层的厚度。发现在多脉冲辐照后,掺杂DLN薄膜的激光诱导石墨化作用更强。

更新日期:2020-11-03
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