Due to its exceptional electrical, optical, chemical and magnetic properties, tin oxide (SnO and SnO₂), which is a functional material, has gained enormous attention for use in a variety of applications. Films of SnO_X have a direct band gap between the ranges of 2.2 and 3.6 eV, with these films finding usefulness in various functions such as solar cells, transparent conducting oxides for gas sensors, lithium-ion batteries and microelectronics, and use in the optoelectronics industries. In order to satisfy the needs of a broad range of these applications, thin films with an extensive properties span defined by film composition, thickness, structural properties and morphology are required. This article explains the theory and research status of the various manufacturing processes of tin oxide. The purpose is to analyze the effects of the thin films through distinct forms of deposition. The general finding summarized in this research on SnO_X showed that various researchers studied specific characteristics of tin oxide properties restricted by experimental conditions.

氧化锡（SnO和SnO ₂）是一种功能材料，由于其出色的电，光，化学和磁性能，因此在各种应用中引起了极大的关注。SnO _X膜具有在2.2至3.6 eV范围内的直接带隙，这些薄膜可用于多种功能，例如太阳能电池，用于气体传感器的透明导电氧化物，锂离子电池和微电子产品，以及在光电子行业中的使用。为了满足这些应用的广泛需求，需要具有由膜组成，厚度，结构特性和形态所限定的广泛特性的薄膜。本文介绍了各种氧化锡制造工艺的理论和研究现状。目的是通过不同形式的沉积来分析薄膜的影响。这项关于SnO _X的研究总结了一般发现 结果表明，许多研究人员研究了受实验条件限制的氧化锡特性的特定特征。