The applicability of Cr₂AlC MAX-phases as protective coatings in energy conversion or aerospace applications requires a dense, single-phase structure. Therefore, we study the effect of target power density and substrate bias on phase formation, microstructure evolution, and mechanical properties of Cr₂AlC coatings utilizing direct current (DCMS) and high-power pulsed magnetron sputtering (HPPMS). Generally, HPPMS results in coatings with superior density and hence larger elastic moduli compared to DCMS, indicating that ion bombardment by ionized film-forming species is beneficial. However, decreasing the substrate bias to −200 V for DCMS and −100 V for HPPMS favors the ion bombardment induced formation of the disordered (Cr,Al)₂C_x solid solution. It is evident that there is an optimum moderate ion energy for the formation of dense Cr₂AlC coatings. Too low energy results in the formation of under-dense coatings. Too high energy yields the formation of (Cr,Al)₂C_x in addition to Cr₂AlC.

Cr ₂ AlC MAX相在能量转换或航空航天应用中作为保护性涂层的适用性需要致密的单相结构。因此，我们利用直流电（DCMS）和大功率脉冲磁控溅射（HPPMS）研究了目标功率密度和衬底偏压对Cr ₂ AlC涂层的相形成，微观结构演变和机械性能的影响。通常，与DCMS相比，HPPMS产生的涂层具有更高的密度，因此具有更大的弹性模量，表明离子化成膜物质对离子的轰击是有益的。但是，对于DCMS，将衬底偏压降低至-200 V，对于HPPMS，将衬底偏压降低至-100 V，则有利于离子轰击引起无序（Cr，Al）₂ C _{x的形成。}实在的方法。显然，对于形成致密的Cr ₂ AlC涂层，存在最佳的适度离子能量。太低的能量导致形成致密涂层。能量太高会导致除Cr ₂ AlC之外还形成（Cr，Al）₂ C _x。