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Spectral and X-Ray Studies of Indium Oxide Films on Sapphire Substrates
Optics and Spectroscopy ( IF 0.8 ) Pub Date : 2020-11-01 , DOI: 10.1134/s0030400x20100252
A. A. Tikhii , Yu. M. Nikolaenko , Yu. I. Zhikhareva , I. V. Zhikharev

Abstract

The results of studying the optical transmission and X-ray diffraction spectra of thin In2O3 films obtained by DC magnetron sputtering on Al2O3 (012) substrates are presented. The diffraction patterns contain a reflex corresponding to the (222) plane of cubic In2O3. Its position shifts from 30.3° to 30.6° with decreasing film thickness. The half-width of this reflex decreases with decreasing deposition time, which may indicate an increase in the grain size of the film material. According to measurements of optical transmission, at the interface between the film and the substrate, the presence of a transition layer with a band gap of 1.39 eV and a thickness of about 40 nm was established. The properties of this layer are independent of the deposition time.



中文翻译:

蓝宝石衬底上氧化铟膜的光谱和X射线研究

摘要

给出了研究通过直流磁控溅射在Al 2 O 3(012)衬底上获得的In 2 O 3薄膜的光学透射率和X射线衍射光谱的结果。衍射图包含与立方In 2 O 3的(222)平面相对应的反射。随着膜厚度的减小,其位置从30.3°移至30.6°。该反射的半宽度随着沉积时间的减少而减小,这可能表明薄膜材料的晶粒尺寸增加。根据光透射率的测量,在膜和基底之间的界面处,存在带隙为1.39eV且厚度为约40nm的过渡层的存在。该层的性质与沉积时间无关。

更新日期:2020-11-02
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