We propose trench-directed self-assembly of a block copolymer driven by a capillary force-induced meniscus as a facile scalable nanolithography method. Unlike conventional directed self-assembly methods, trench-directed self-assembly enables the achievement of neutral surface-free vertical orientations of the block copolymer nanopatterns irrespective of the polarizability of the substrate, which may be, for example, a ceramic (SiO2) on Semiconductor (Si). In our demonstration of the proposed method, we generated various morphologies of the block copolymer nanopatterns by varying the trench width, and molecular weight of the block copolymer. The proposed trench-directed self-assembly method is potentially advantageous for the design of a process/device layout required for the development of an effective manufacturing process.

中文翻译：

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利用毛细管力诱导弯月面在沟槽中无中性层定向自组装嵌段共聚物

我们提出了由毛细管力诱导的弯月面驱动的嵌段共聚物的沟槽定向自组装作为一种简便的可扩展纳米光刻方法。与传统的定向自组装方法不同，沟槽定向自组装能够实现嵌段共聚物纳米图案的中性无表面垂直取向，而不管基材的极化率如何，例如，可以是陶瓷 (SiO2)半导体 (Si)。在我们对所提出方法的演示中，我们通过改变沟槽宽度和嵌段共聚物的分子量来生成嵌段共聚物纳米图案的各种形态。所提出的沟槽定向自组装方法对于开发有效制造工艺所需的工艺/器件布局的设计具有潜在的优势。