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Plasma simulation for dual-frequency capacitively coupled plasma incorporating gas flow simulation
Japanese Journal of Applied Physics ( IF 1.5 ) Pub Date : 2020-10-30 , DOI: 10.35848/1347-4065/abc106
Shigeyuki Takagi 1 , Takumi Chikata 1 , Makoto Sekine 2
Affiliation  

We aimed to improve the calculation accuracy by focusing on the neutral radical Ar * and electron density in a dual-frequency excited Ar plasma. The neutral radical Ar * has a long lifetime and becomes exhausted without actually disappearing. The coupled calculation of plasma and gas flow simulation was performed, and confirmed that Ar * in the coupled calculation spreads around, which was not shown by plasma simulation only. Regarding electron density, the effect of the secondary electron emission (SEE) factor was evaluated on basis of the measured electron density. The errors of electron densities between the experimental and simulation results were decreased from 36% to 17% by adding the effect of secondary electrons from the electrodes to the plasma simulation. It was shown that the coupled calculation and the addition of SEE are effective for calculating the dual-frequency excited Ar plasma.

中文翻译:

结合气流模拟的双频电容耦合等离子体的等离子体模拟

我们的目标是通过关注双频激发Ar等离子体中的中性自由基Ar *和电子密度来提高计算精度。中性自由基Ar *的寿命长,并且耗尽而实际上并未消失。进行了等离子体和气流模拟的耦合计算,并确认了耦合计算中的Ar *扩散,这仅由等离子体模拟未显示。关于电子密度,基于测得的电子密度来评估二次电子发射(SEE)因子的影响。通过将来自电极的二次电子效应添加到等离子体模拟中,实验和模拟结果之间的电子密度误差从36%降低到17%。
更新日期:2020-10-30
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