Successful metal liftoff requires a retrograde photoresist profile, or one created using a bi-layer process. Coupled with an evaporator setup for liftoff deposition, these ensure a discontinuity in metal coverage so that the unwanted field metal can be lifted off cleanly, without tearing or defects. An evaporator with an optimized liftoff configuration necessitates precise source-to-substrate alignment or defects will result. While a lot of development work has been reported on photoresist processes and liftoff techniques, a lack of publication on ideal evaporator geometry and proper setup suggests that the effects of source to substrate alignment have seldom been investigated or discussed. An evaporant flux with precise normality is essential to achieving clean metal liftoff. This paper examines how evaporator geometry influences the liftoff process. We will reveal the working principle of a special alignment tool and how the tool is used to keep the evaporator in precise alignment

中文翻译：

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通过优化蒸发器圆顶对齐消除金属围栏

成功的金属剥离需要逆行光刻胶轮廓，或使用双层工艺创建的轮廓。结合用于剥离沉积的蒸发器设置，这些可确保金属覆盖的不连续性，从而可以将不需要的现场金属干净地剥离，而不会出现撕裂或缺陷。具有优化剥离配置的蒸发器需要精确的源到基板对齐，否则会导致缺陷。虽然在光刻胶工艺和剥离技术方面已经报道了很多开发工作，但缺乏理想的蒸发器几何形状和正确设置的出版物表明很少研究或讨论源到基板对齐的影响。具有精确常态的蒸发通量对于实现清洁的金属剥离至关重要。本文研究了蒸发器几何形状如何影响升空过程。我们将揭示特殊对中工具的工作原理以及如何使用该工具来保持蒸发器精确对中