In this study, we have developed a method to quantify inherent conditioner-to-conditioner variation using a mathematical model. Quantification of the lifetime of pad and conditioner in a chemical mechanical planarization (CMP) process using the model is also elucidated. Three conditioner types are selected based on their aggressiveness, and conditioning experiments are performed with five different conditioners of the same type to quantify the variation. Assuming exponential decay equation for pad wear rate (PWR), a simple model is developed and the model parameters, K and λ, are derived in numeric form. K, a measure of conditioner aggressiveness, can be used as a metric to assess conditioner-to-conditioner variation, while λ is a measure of conditioner lifetime. K and λ values are also used to predict the failure mode of a CMP process (conditioner or pad failure mode). Pad groove depth and PWR curves of five different conditioners of the same type as a function of time are plotted along with upper and lower limits. The limiting factor (low PWR due to conditioner decay or excess pad removal) is identified to predict the failure mode. An example for each failure mode (A122 and 8031C1 conditioners for conditioner and pad failure modes, respectively) is presented.

中文翻译：

---

一种在化学机械平坦化 (CMP) 环境中量化调节器间变化并预测调节器寿命和工艺故障模式的新方法


在这项研究中，我们开发了一种使用数学模型来量化调理剂与调理剂之间固有变化的方法。还阐明了使用该模型对化学机械平坦化 (CMP) 工艺中的抛光垫和调节器的寿命进行的量化。根据其攻击性选择三种调理剂类型，并使用同一类型的五种不同调理剂进行调理实验以量化变化。假设衬垫磨损率 (PWR) 为指数衰减方程，则开发了一个简单的模型，并以数值形式导出了模型参数 K 和 λ。 K 是调节器攻击性的衡量标准，可用作评估调节器之间差异的指标，而 λ 是调节器寿命的衡量标准。 K 和 λ 值还用于预测 CMP 工艺的失效模式（调节器或抛光垫失效模式）。绘制了同一类型的五种不同调节器的垫槽深度和 PWR 随时间变化的曲线以及上限和下限。确定限制因素（由于调节器衰减或去除过多垫而导致的低 PWR）以预测故障模式。给出了每种故障模式的示例（A122 和 8031C1 调节器分别用于调节器和垫故障模式）。