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Effects of the target-to-substrate distance on the microstructure and properties of TiN coatings fabricated by pulse-enhanced vacuum arc evaporation
Journal of Adhesion Science and Technology ( IF 2.7 ) Pub Date : 2020-10-27 , DOI: 10.1080/01694243.2020.1836763 Yinghe Ma 1 , Kexin Zhang 2 , Jianguo Yang 1 , Xiubo Tian 3 , Chunzhi Gong 3 , Wenjian Zheng 1 , Yanming He 1 , Zengliang Gao 1 , Lianfeng Wei 4 , Paul K. Chu 5
Journal of Adhesion Science and Technology ( IF 2.7 ) Pub Date : 2020-10-27 , DOI: 10.1080/01694243.2020.1836763 Yinghe Ma 1 , Kexin Zhang 2 , Jianguo Yang 1 , Xiubo Tian 3 , Chunzhi Gong 3 , Wenjian Zheng 1 , Yanming He 1 , Zengliang Gao 1 , Lianfeng Wei 4 , Paul K. Chu 5
Affiliation
Pulse-enhanced vacuum arc evaporation (PEVAE) is promising in surface engineering and produces coatings with better structure and properties. In PEVAE, the target-to-substrate distance (D t-s) affe...
中文翻译:
靶基距离对脉冲增强真空电弧蒸发制备TiN涂层组织和性能的影响
脉冲增强真空电弧蒸发 (PEVAE) 在表面工程中很有前景,可生产具有更好结构和性能的涂层。在 PEVAE 中,目标到基板的距离 (D ts) 影响...
更新日期:2020-10-27
中文翻译:
靶基距离对脉冲增强真空电弧蒸发制备TiN涂层组织和性能的影响
脉冲增强真空电弧蒸发 (PEVAE) 在表面工程中很有前景,可生产具有更好结构和性能的涂层。在 PEVAE 中,目标到基板的距离 (D ts) 影响...