Abstract VO2 is a well-known thermochromic material that can be potentially applied as a coating on “smart” glazing systems. In this work VO2 thermochromic films, were grown by the rf sputtering technique on two different types of commercial glass substrates, namely fused silica and float glass, at the low deposition temperature of 300 °C. The optimum deposition conditions, in order to succeed the thermochromic monoclinic phase of VO2(M), were investigated and found to be subject to substrate and thickness. It was observed that on the float glass substrate, only films with thicknesses below 50 nm grown with 3% O2 in plasma exhibited a thermochromic behavior, displaying a critical transition temperature of TC = 46.1 °C, width of transmittance hysteresis loop at 2000 nm ΔTC = 9.1 °C, IR-switching ΔTrIR = 14.6%, integrated solar transmittance modulation ΔTrsol = 1.3% and integrated luminous transmittance at 25 °C equal to Trlum = 36.6%. In contrast, films deposited on fused silica glass demonstrated a thermochromic phase, for all thicknesses, when grown with 1% O2 in the plasma. These thermochromic films were characterized by much lower TC(

中文翻译：

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用于智能玻璃应用的商用玻璃基板上的溅射 VO2 涂层

摘要 VO2 是一种众所周知的热致变色材料，可潜在地用作“智能”玻璃系统上的涂层。在这项工作中，VO2 热致变色薄膜通过射频溅射技术在两种不同类型的商业玻璃基板上生长，即熔融石英和浮法玻璃，在 300°C 的低沉积温度下。为了继 VO2(M) 的热致变色单斜相，研究了最佳沉积条件并发现其受基材和厚度的影响。据观察，在浮法玻璃基板上，只有在等离子体中用 3% O2​​ 生长的厚度低于 50 nm 的薄膜表现出热致变色行为，显示临界转变温度 TC = 46.1 °C，透射率滞后回线宽度为 2000 nm ΔTC = 9.1 °C，IR 开关 ΔTrIR = 14.6%，集成太阳能透射率调制 ΔTrsol = 1.3%，25 °C 下的集成光透射率等于 Trlum = 36.6%。相比之下，沉积在熔融石英玻璃上的薄膜在等离子体中用 1% O2 生长时，对于所有厚度都显示出热致变色相。这些热致变色薄膜的特点是温度低得多（