Impressment of Cobalt and Nickel based alloys in industries for the last few years attracted many researchers due to its significant features of physical, chemical and magnetic properties. The present work focused the structural, compositional, morphological and magnetic properties of Cobalt Nickel alloy thin film growth by one of the chemical methods. Thin films of Cobalt Nickel have been deposited on various substrates by means of low cost galvanostatic electrodeposition technique. Structural investigation showed that the deposited films have face centred cubic structure with orientation of crystallites along (111) plane. The structural parameters such as crystallite size, rms microstrain, dislocation density and stacking fault probability are estimated for the deposited films. Morphological features along with film composition showed that the deposited films have smooth surface with stoichiometry. Magnetic properties such as coercivity, remanence, retentivity was estimated and the results are reported.

由于钴，镍基合金的物理，化学和磁性性质的显着特征，近几年在工业上的应用吸引了许多研究人员。目前的工作集中于通过一种化学方法生长钴镍合金薄膜的结构，组成，形态和磁性。钴镍薄膜已通过低成本恒电流电镀技术沉积在各种基材上。结构研究表明，沉积的薄膜具有面心立方结构，且晶体沿（111）平面取向。对于沉积膜，估计了结构参数，如微晶尺寸，均方根微应变，位错密度和堆垛层错概率。形态特征以及膜组成表明，所沉积的膜具有化学计量的光滑表面。估算了矫顽力，剩磁，保持力等磁性能，并报告了结果。