Synthesis, characterization, and use of an amidoalane precursor for the deposition of high-quality and low-impurity aluminum nitride films by atomic layer deposition. This study highlights the importance of smart precursor design in order to deposit high-quality thin films at low cost and high efficiency.

中文翻译：

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用于原子层沉积的高质量氮化铝的低成本，高效率的TMA置换

酰胺基烷烃前体的合成，表征和用途，用于通过原子层沉积来沉积高质量和低杂质的氮化铝膜。这项研究强调了智能前驱体设计的重要性，以便以低成本和高效率沉积高质量的薄膜。