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Fabrication of Graphitic Carbon Nitride‐Based Film: An Emerged Highly Efficient Catalyst for Direct C—H Arylation under Solar Light
Chinese Journal of Chemistry ( IF 5.5 ) Pub Date : 2020-10-23 , DOI: 10.1002/cjoc.202000470
Surabhi Chaubey 1 , Rajesh K. Yadav 1 , Tae Wu Kim 2 , Tara Chand Yadav , Abhishek Kumar , D. K. Dwivedi , B. K. Pandey , Atul P. Singh
Affiliation  

Photoredox C—H bond formation can proceed in aerobic environment under solar light and has therefore become attractive. Nowadays, different types of expensive novel metal complexes and nanomaterials have been urbanized as photocatalysts for direct C—H bond formation in between derivatives of heteroarenes (HAs) and aryl diazonium salts. These photocatalysts, however, still suffer from poor stability, high cost, and decay. Herein, a graphitic carbon nitride‐based fluorescein isothiocyanate (g‐C3N4–FITC) film photocatalyst has been reported, which shows excellent light harvesting ability, and band gap suitability to catalyze the metal free direct C—H arylation of HAs under solar light at ambient temperature. Moreover, the g‐C3N4–FITC film photocatalyst can be reused four times without significant loss of activity, confirming the excellent photocatalytic stability. The current strategy to construct a g‐C3N4–FITC film photocatalyst for direct C—H arylation opens a new path towards replacing metal‐based catalysts in fine chemical synthesis.image

中文翻译:

石墨化氮化碳基薄膜的制备:一种在太阳光下直接CH-H酰化反应的新兴高效催化剂

光氧化还原CH键可以在有氧环境中在太阳光下进行,因此变得有吸引力。如今,不同类型的昂贵新型金属配合物和纳米材料已被城市化,作为在杂芳烃(HAs)和芳基重氮盐衍生物之间直接形成CH键的光催化剂。然而,这些光催化剂仍然遭受差的稳定性,高成本和衰变的困扰。本文报道了一种基于石墨碳氮化物的异硫氰酸荧光素(g ‐ C 3 N 4 –FITC)薄膜光催化剂,该催化剂具有优异的光收集能力,并且能带隙适应性强,可在高温下催化HA的无金属直接CH芳基化环境温度下的太阳光。此外,g‐ C3 N 4 –FITC薄膜光催化剂可以重复使用四次,而活性没有明显损失,这证明了其优异的光催化稳定性。构造用于直接CH芳基化的g- C 3 N 4 -FITC薄膜光催化剂的当前策略为精细化学合成中替代金属基催化剂开辟了一条新途径。图像
更新日期:2020-10-23
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