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Graphitic Carbon Nitride-Based Photocatalytic Materials: Preparation Strategy and Application
ACS Sustainable Chemistry & Engineering ( IF 7.1 ) Pub Date : 2020-10-21 , DOI: 10.1021/acssuschemeng.0c05246
Liyan Wang 1 , Kehan Wang 1 , Tingting He 1 , Yang Zhao 1 , Hua Song 1 , Huan Wang 1
Affiliation  

Among various kinds of photocatalytic semiconductors, graphitic carbon nitride (g-C3N4)-based photocatalysts have become the most attractive “celebrity” because of their stable chemical properties, appropriate band structure, and facile synthesis. Here, we provide a systematic review of g-C3N4-based photocatalytic materials based on the latest related research progress. The design ideas and preparation methods of g-C3N4-based photocatalysts are summarized, including morphology control of a three-dimensional structure, active site engineering, defect/vacancy engineering, and interface engineering. In addition, the typical applications of g-C3N4-based photocatalysts are also discussed in detail, involving water splitting (overall water splitting, H2 evolution, O2 evolution), organic transformation reactions (oxidation reaction, reduction reaction, coupling reaction), and degradation of organic pollutants. This perspective ends with a summary and perspectives on facing the challenges and directions of future development in this research field.

中文翻译:

石墨碳氮化物基光催化材料:制备策略及应用

在各种类型的光催化半导体中,基于石墨碳氮化物(gC 3 N 4)的光催化剂由于其稳定的化学性质,合适的能带结构和易于合成而成为最吸引人的“名人”。在此,我们根据最新的相关研究进展,对基于gC 3 N 4的光催化材料进行系统的综述。总结了基于gC 3 N 4的光催化剂的设计思想和制备方法,包括三维结构的形态控制,活性位点工程,缺陷/空位工程和界面工程。另外,gC 3 N 4的典型应用基光催化剂也进行了详细讨论,涉及水分解(整体水分解,H 2析出,O 2析出),有机转化反应(氧化反应,还原反应,偶联反应)和有机污染物的降解。该观点以总结和观点来结束,这些观点和观点是面对该研究领域未来发展的挑战和方向的。
更新日期:2020-11-02
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