To practically utilize an electrochemically deposited Al film in microsystems, its material properties have to be elucidated, along with the influence of different deposition conditions. In this study, microstructure, electrical, mechanical and thermal properties of electrochemically deposited Al film from a chloroaluminate ionic liquid electrolyte are comprehensively investigated. The nanoindentation hardness and elastic modulus of the film varied between 486–908 MPa and 41–102 GPa, respectively, depending on the deposition condition. The electrical resistivity and the coefficient of thermal expansion varied between 51–160 nΩ m and 2–20 ppm/K, respectively. The results are compared to those of Al thin films deposited using other techniques. The characterized properties were found to be associated to the microstuctures of the deposits, which can be tailored by the deposition conditions. The microstructures of the deposits were comprehensively characterized by cross-sectional scanning electron microscope (SEM) and electron backscatter diffraction (EBSD) spectroscopy. These results are useful as a design guide for the future applications of the film.

为了在微系统中实际使用电化学沉积的Al膜，必须阐明其材料特性以及不同沉积条件的影响。在这项研究中，全面研究了从氯铝酸盐离子液体电解质中电化学沉积的铝膜的微观结构，电学，机械和热学性质。膜的纳米压痕硬度和弹性模量分别在486–908 MPa和41–102 GPa之间变化，具体取决于沉积条件。电阻率和热膨胀系数分别在51–160nΩm和2–20 ppm / K之间变化。将结果与使用其他技术沉积的Al薄膜的结果进行比较。发现其特性与沉积物的微观结构有关，可以根据沉积条件进行调整。通过截面扫描电子显微镜（SEM）和电子背散射衍射（EBSD）光谱对沉积物的微观结构进行了全面表征。这些结果可作为该膜未来应用的设计指南。