当前位置: X-MOL 学术Appl. Sci. › 论文详情
Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)
A Miniaturized and Fast System for Thin Film Thickness Measurement
Applied Sciences ( IF 2.5 ) Pub Date : 2020-10-18 , DOI: 10.3390/app10207284
Ran Hao , Linlin Zhu , Zexiao Li , Fengzhou Fang , Xiaodong Zhang

Transparent films are significant industrial components that are widely used in modern optics, microelectronics, optical engineering, and other related fields. There is an urgent need for the fast and stable thickness measurement of industrial films at the micron-grade. This paper built a miniaturized and low-cost film thickness measurement system based on confocal spectral imaging and the principle of thin-film spectral interference. The reflection interference spectrum was analyzed to extract the phase term introduced by the film thickness from the full spectrum information, where local spectral noise can be better corrected. An efficient and robust film thickness calculation algorithm was realized without any calibrating sample. The micron-grade thickness measurement system had an industrial property with a measurement range of up to 75 μm with a measurement uncertainty of 0.1 μm, presenting a good performance in single-layer film thickness measurement with high efficiency.

中文翻译:

一种用于薄膜厚度测量的小型化快速系统

透明薄膜是重要的工业部件,广泛应用于现代光学、微电子、光学工程等相关领域。迫切需要快速稳定地测量微米级工业薄膜的厚度。本文基于共焦光谱成像和薄膜光谱干涉原理,构建了一种小型化、低成本的薄膜厚度测量系统。分析反射干涉光谱,从全光谱信息中提取薄膜厚度引入的相位项,可以更好地校正局部光谱噪声。无需任何校准样品即可实现高效且稳健的薄膜厚度计算算法。
更新日期:2020-10-18
down
wechat
bug