The lifespan of plasma discharge devices is strongly influenced by the deterioration characteristics of MgO protective layer deposited on the dielectric covering the electrode. In order to attain both lower driving voltage and higher luminous efficiency in these devices, different complex metal oxides protective layers have been extensively studied as alternatives to MgO. However, the interaction between energetic ions and fast neutral atoms with the protective layer can produce serious damages to it and their nearby components. In this paper, we study the ion beam bombardment for several protective layers by low-energy noble gas with various ion incidence angles by using the Monte Carlo simulation. On the basis of the binary collision approximation using SRIM-2013, different parameters are discussed for instance backscattering yield, retained dose, sputtering yield, number of vacancies, and ion range of MgO, (Mg,Ca)O, (Mg,Sr)O, (Mg,Ba)O and (Mg,Ca,Sr)O. From our results, the retained dose, sputtering yield and number of vacancies of complex metal oxide protective layers are lower than that of MgO. Moreover, the backscattering yield increases by increasing the incident angles and it is highest for complex metal oxide protective layers.

中文翻译：

---

在等离子体放电装置中用惰性气体离子轰击 MgO 和复合氧化物保护薄层的 Monte Carlo 模拟

等离子体放电装置的寿命受到沉积在覆盖电极的电介质上的 MgO 保护层的劣化特性的强烈影响。为了在这些器件中获得更低的驱动电压和更高的发光效率，已经广泛研究了不同的复合金属氧化物保护层作为 MgO 的替代品。然而，高能离子和快速中性原子与保护层之间的相互作用会对保护层及其附近的组件产生严重的损害。在本文中，我们使用蒙特卡罗模拟研究了不同离子入射角的低能惰性气体对几个保护层的离子束轰击。在使用 SRIM-2013 的二元碰撞近似的基础上，讨论了不同的参数，例如反向散射产率，保留剂量、溅射产率、空位数量和 MgO、(Mg,Ca)O、(Mg,Sr)O、(Mg,Ba)O 和 (Mg,Ca,Sr)O 的离子范围。从我们的结果来看，复合金属氧化物保护层的保留剂量、溅射率和空位数量低于 MgO。此外，背散射产率通过增加入射角而增加，并且复合金属氧化物保护层最高。