The molybdenum silicon nitride (Mo–Si–N) films were deposited by a radio frequency (RF) magnetron reactive dual-gun co-sputtering technique with process control on input power and gas ratio. Composition variation, microstructure evolution, and related mechanical and tribological behavior of the Mo–Si–N coatings were investigated. The N₂/(Ar + N₂) flow ratios were controlled at 10/20 and 5/20 levels with the tuning of input power on the Si target at 0, 100, and 150 W. As the silicon contents increased from 0 to 33.7 at.%, the film microstructure evolved from a crystalline structure with Mo₂N and MoN phases to an amorphous feature with the Si₃N₄ phase. The analysis of selected area electron diffraction patterns in TEM also indicated an amorphous feature of the Mo–Si–N films when Si content reached 20 at.% and beyond. The hardness and Young’s modulus changed from 16.5 to 26.9 and 208 to 273 GPa according to their microstructure features. The highest hardness and modulus were attributed to nanocrystalline Mo₂N and MoN with Si solid-solution. The crystalline Mo–Si–N films showed a smooth tribological track and less wear failure was found. In contrast, the wear track with severe failures were observed for Mo–N and amorphous Mo–Si–N coatings due to their lower hardness. The ratios of H/E and H³/E² were intensively discussed and correlated to the wear behavior of the Mo–Si–N coatings.

中文翻译：

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Mo-Si-N薄膜的微观结构演变和力学行为

通过射频（RF）磁控反应双枪共溅射技术沉积钼氮化硅（Mo–Si–N）薄膜，并控制输入功率和气体比率。研究了Mo-Si-N涂层的成分变化，微观结构演变以及相关的机械和摩擦学行为。将N ₂ /（Ar + N ₂）流量比控制在10/20和5/20的水平，同时将硅靶材上的输入功率调整为0、100和150W。随着硅含量从0增加到0 33.7 at。％的薄膜微观结构从具有Mo ₂ N和MoN相的晶体结构演变为具有Si ₃ N ₄的非晶结构相。TEM中选定区域电子衍射图的分析还表明，当Si含量达到20 at。％或更高时，Mo–Si–N膜将呈现非晶态特征。硬度和杨氏模量根据其微观结构特征从16.5变为26.9，从208变为273 GPa。最高的硬度和模量归因于具有Si固溶体的纳米晶体Mo ₂ N和MoN。结晶的Mo-Si-N薄膜显示出光滑的摩擦轨迹，并且发现的磨损失败较少。相反，由于Mo–N和非晶Mo–Si–N涂层硬度较低，因此观察到严重磨损的磨损轨迹。H / E与H ³ / E ²的比率 进行了深入的讨论，并将其与Mo–Si–N涂层的磨损行为相关联。