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Formation mechanism of amorphous silicon nanoparticles with additional counter-flow quenching gas by induction thermal plasma
Chemical Engineering Science ( IF 4.1 ) Pub Date : 2021-02-01 , DOI: 10.1016/j.ces.2020.116217
Xiaoyu Zhang , Zishen Liu , Manabu Tanaka , Takayuki Watanabe

Abstract The fabrication process of amorphous silicon nanoparticles by induction thermal plasma was studied by experiments and numerical simulations. Additional quenching gas was introduced as counter-flow to the plasma tail flame to enhance quenching effect. The flow rate of quenching gas ranged from 0 to 70 L/min. Amorphous silicon nanoparticles were confirmed by electronic diffraction analysis with random shapes and serious agglomerate, while the crystal particles had a totally different morphology of spherical and freestanding. The quenching rate was estimated on the basis of numerical results and increased from 3.2x104 to 8.9x105 K/s with quenching gas flow rate. The amount of amorphous silicon increased as quenching gas injection and should be attributed to the improved preparation of small nanoparticles (

中文翻译:

感应热等离子体加逆流淬火气体非晶硅纳米粒子的形成机理

摘要 通过实验和数值模拟研究了感应热等离子体制备非晶硅纳米颗粒的过程。额外的淬火气体以逆流方式引入等离子尾焰以增强淬火效果。淬火气体的流速范围为 0 至 70 L/min。电子衍射分析证实无定形硅纳米颗粒具有随机形状和严重团聚,而晶体颗粒具有完全不同的球形和独立形貌。淬火速率是根据数值结果估算的,随着淬火气体流速从 3.2x104 K/s 增加到 8.9x105 K/s。随着淬火气体的注入,非晶硅的数量增加,这应该归因于小纳米颗粒的制备得到改善(
更新日期:2021-02-01
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